ASML has almost a monopoly in the market for lithographic equipment for the production of semiconductors. And now the Japanese manufacturer Canon intends to compete with it. A plant for the production of new lithographic equipment will be built in Japan. The estimated investment will amount to $345 million, and production will start in the spring of 2025.
It is important to note that for the production there will use a technology called nanoprinting lithography. It eliminates the need for EUV lithography (deep ultraviolet lithography), which requires a lot of energy and is expensive. EUV lithography machines only produce ASML.
Canon’s new technology will reduce the cost of production due to the fact that nanoprinted lithography can reduce production costs by up to 40% and energy consumption by up to 90%.
Note that the technology of nanoprinted lithography was developed more than 10 years ago, it allows you to create schemes for 10 nanometers with a potential reduction to 2-3 nanometers. However, implementation issues forced the market to switch to EUV lithography. If the technology can prove its worth, this can lead to a significant reduction in the cost of microelectronics.
Previously reportedthat US authorities require ASML Holding NV not to supply chip manufacturing equipment to China